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82009, Novolack, O-Naphto-Chinon-Diazide Etching Chemical for Etching in Liquid

RS Stock No.: 173-886Brand: Kontakt ChemieManufacturers Part No.: 82009
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Technical Document

Specifications

Process Type

Etching

Material

Novolack, O-Naphto-Chinon-Diazide

Ferric Chloride Form

Liquid

Trade Name

POSITIV 20

Country of Origin

Belgium

Product details

KONTAKT POSITIV 20 - positive photo-sensitive lacquer

Positive photo-sensitive lacquer for manufacturing printed circuit boards, with clear copper tracks laminated onto epoxy FR4 or Bakelite.
Positive work: can be used with a Mylar transparent film or a single traced design; the printed circuit diagram is always the image of the original positive.
Blue sensitive layer is resistant to etching agents when not insulated.
Perfectly uniform, even layer.

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€ 21.03

Each (Exc. Vat)

82009, Novolack, O-Naphto-Chinon-Diazide Etching Chemical for Etching in Liquid

€ 21.03

Each (Exc. Vat)

82009, Novolack, O-Naphto-Chinon-Diazide Etching Chemical for Etching in Liquid
Stock information temporarily unavailable.

Technical Document

Specifications

Process Type

Etching

Material

Novolack, O-Naphto-Chinon-Diazide

Ferric Chloride Form

Liquid

Trade Name

POSITIV 20

Country of Origin

Belgium

Product details

KONTAKT POSITIV 20 - positive photo-sensitive lacquer

Positive photo-sensitive lacquer for manufacturing printed circuit boards, with clear copper tracks laminated onto epoxy FR4 or Bakelite.
Positive work: can be used with a Mylar transparent film or a single traced design; the printed circuit diagram is always the image of the original positive.
Blue sensitive layer is resistant to etching agents when not insulated.
Perfectly uniform, even layer.